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Please use this identifier to cite or link to this item: http://repository.li.mahidol.ac.th/dspace/handle/123456789/11751
Title: Investigation of the use of rotating linearly polarized light for characterizing SiO <inf>2</inf> thin-film on Si substrate
Authors: C. Pawong
R. Chitaree
C. Soankwan
Mahidol University
Keywords: Computer Science;Engineering;Materials Science;Physics and Astronomy
Issue Date: 1-Dec-2011
Citation: 2011 Asia Communications and Photonics Conference and Exhibition, ACP 2011. (2011)
Abstract: This research is based on the Fresnel's equations and the ellipsometric technique that investigate the sample of SiO 2 thin-film on Si substrate. The investigation is made by a probing beam which is in the form of a rotating linearly polarized light generated by the polarizing Mach-Zehnder interferometer (pMZi). The detection of the changed polarization states of the incident light due to reflection on the sample surfaces led to a set of unique characteristics describing a thin-film substrate system in terms of ellipsometric parameters φ and Δ. SiO 2 thin-films were chosen to study because of their well known characteristics. The accuracy of measurements was confirmed by comparisons to calculated values derived from Fresnel's equations and a standard instrument. The results clearly reveal a feasibility of using the rotating linearly polarized light produced by pMZi for a non-destructive characterization of the thin-film system. © 2011 SPIE-OSA-IEEE.
URI: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84864105786&origin=inward
http://repository.li.mahidol.ac.th/dspace/handle/123456789/11751
Appears in Collections:Scopus 2011-2015

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