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dc.contributor.authorPaveena Tangudomen_US
dc.contributor.authorIgnacio Martín-Fabianien_US
dc.contributor.authorBenjaphorn Prapagdeeen_US
dc.contributor.authorEkachai Wimolmalaen_US
dc.contributor.authorTeerasak Markpinen_US
dc.contributor.authorNarongrit Sombatsompopen_US
dc.contributor.otherFaculty of Environment and Resource Studies, Mahidol Universityen_US
dc.contributor.otherKing Mongkut s University of Technology Thonburien_US
dc.contributor.otherLoughborough Universityen_US
dc.identifier.citationJournal of Reinforced Plastics and Composites. (2020)en_US
dc.description.abstract© The Author(s) 2020. The mechanical and antibacterial properties of acrylic rubber/poly(methyl methacrylate) (AR/PMMA) blend at 10 to 50 wt% of AR content with non-treated and treated titanium dioxide (TiO2) and 2-Hydroxypropyl-3-piperazinyl-quinoline carboxylic acid methacrylate (HPQM) by N-2(aminoethyl)-3-aminopropyl trimethoxysilane were studied. The antibacterial property against Escherichia coli was evaluated. The results found that the mechanical properties of ARt-TiO2/PMMA and ARt-HPQM/PMMA blend were higher than that of the ARTiO2/PMMA and ARHPQM/PMMA blend. For antibacterial property, the ARHPQM/PMMA and ARt-HPQM/PMMA blend could act as the antibacterial material, while the ARTiO2/PMMA blend did not show. However, the ARt-TiO2/PMMA blend could inhibit bacterial cell growth with 10 to 30 wt% of AR content. The recommended compositions of ARt-TiO2/PMMA blend, which improved both mechanical and antibacterial properties, were 10 to 30 wt% of AR and were 10 to 50 wt% of AR for ARt-HPQM/PMMA. Moreover, the UV radiation increased the antibacterial properties by the destruction of the interaction in treated TiO2 and HPQM and improved the antibacterial performance of ARt-TiO2/PMMA and ARt-HPQM/PMMA blend.en_US
dc.rightsMahidol Universityen_US
dc.subjectMaterials Scienceen_US
dc.titleImprovement of mechanical-antibacterial performances of AR/PMMA with TiO<inf>2</inf> and HPQM treated by N-2(aminoethyl)-3-aminopropyl trimethoxysilaneen_US
Appears in Collections:Scopus 2020

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