Publication:
Effect of defect sites in charge carrier mobility enhancement of hopping model

dc.contributor.authorT. Osotchanen_US
dc.contributor.authorS. Pengmanayolen_US
dc.contributor.otherMahidol Universityen_US
dc.date.accessioned2018-09-13T06:36:16Z
dc.date.available2018-09-13T06:36:16Z
dc.date.issued2009-10-27en_US
dc.description.abstractCharge carrier mobility in disorder materials was described by hopping model and the increasing in the mobility value of existing defect or impurity sites was investigated by Monte Carlo simulation of the rectangular hopping site. In the case of equal tunneling rate, the mobility value increases when the defect sites have higher energy and becomes saturate at the site energy about 1.04 times of the host energy. It found that the maximum mobility occurs when there are defect sites about 40 percents. When the tunneling rate to the defect site is reduced the maximum mobility occurs at higher percent of defect sites. In addition the other type of mobility enhancement appears when the defect site has energy lower than 0.92 times of the host site energy and this occurs only at small amount of the defect sites (less than 10 percents). This type of the enhancement exhibits much higher value of the carrier mobility and the result indicates the mobility value up to about three times of the host value. ©2009 IEEE.en_US
dc.identifier.citationProceedings - 2009 13th International Workshop on Computational Electronics, IWCE 2009. (2009)en_US
dc.identifier.doi10.1109/IWCE.2009.5091109en_US
dc.identifier.other2-s2.0-70350234817en_US
dc.identifier.urihttps://repository.li.mahidol.ac.th/handle/20.500.14594/27545
dc.rightsMahidol Universityen_US
dc.rights.holderSCOPUSen_US
dc.source.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=70350234817&origin=inwarden_US
dc.subjectEngineeringen_US
dc.subjectMaterials Scienceen_US
dc.titleEffect of defect sites in charge carrier mobility enhancement of hopping modelen_US
dc.typeConference Paperen_US
dspace.entity.typePublication
mu.datasource.scopushttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=70350234817&origin=inwarden_US

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