Publication: Tuning the growth mechanism of ZnO nanowires by controlled carrier and reaction gas modulation in thermal CVD
Issued Date
2012-10-04
Resource Type
ISSN
19487185
Other identifier(s)
2-s2.0-84867169423
Rights
Mahidol University
Rights Holder(s)
SCOPUS
Bibliographic Citation
Journal of Physical Chemistry Letters. Vol.3, No.19 (2012), 2815-2821
Suggested Citation
Andreas Menzel, Kittitat Subannajui, Rakshit Bakhda, Yabin Wang, Ralf Thomann, Margit Zacharias Tuning the growth mechanism of ZnO nanowires by controlled carrier and reaction gas modulation in thermal CVD. Journal of Physical Chemistry Letters. Vol.3, No.19 (2012), 2815-2821. doi:10.1021/jz301103s Retrieved from: https://repository.li.mahidol.ac.th/handle/123456789/14371
Research Projects
Organizational Units
Authors
Journal Issue
Thesis
Title
Tuning the growth mechanism of ZnO nanowires by controlled carrier and reaction gas modulation in thermal CVD
Other Contributor(s)
Abstract
A general schematic is developed for the main parameters leading to the formation of vapor-solid and catalyst-assisted-grown ZnO nanowires. We developed a schematic representation of the different parameters influencing the growth and discuss them in detail. Selected shape diagrams are presented that correlate the various changes in parameters (carrier and reaction gas flow, powder and substrate temperature) to the observed nanostructures. With the help of the here-presented shape diagrams, we are able to identify unique parameter ranges for film formation, vapor-solid growth, and the switching to the catalyst-assisted VLS-growth mechanism. The systematic experiments demonstrate the controlled growth of VS and catalyst-assisted-grown ZnO nanowires in a CVD reactor by the carbothermal reduction method based on either upstream or downstream deposition techniques. © 2012 American Chemical Society.