Publication: High-intensity nanosecond pulsed electric field effects on early physiological development in Arabidopsis thaliana
| dc.contributor.author | Wisuwat Songnuan | en_US |
| dc.contributor.author | Phumin Kirawanich | en_US |
| dc.contributor.other | Mahidol University | en_US |
| dc.date.accessioned | 2018-05-03T08:11:51Z | |
| dc.date.available | 2018-05-03T08:11:51Z | |
| dc.date.issued | 2011-05-01 | en_US |
| dc.description.abstract | The influences of pulsed electric fields on early physiological development in Arabidopsis thaliana were studied. Inside a 4-mm electroporation cuvette, pre-germination seeds were subjected to high-intensity, nanosecond electrical pulses generated using laboratory-assembled pulsed electric field system. The field strength was varied from 5 to 20 kV.cm -1 and the pulse width and the pulse number were maintained at 10 ns and 100, respectively, corresponding to the specific treatment energy from 300 J.kg -1 to 4.5 kJ.kg -1 . Statistical analyses on the average leaf area 5 and 15 days following pulsed electric field treatment showed that the effects appear significant the second week after treatments with a maximum increase of 80% compared to the control (P < 0.01). | en_US |
| dc.identifier.citation | World Academy of Science, Engineering and Technology. Vol.77, (2011), 208-212 | en_US |
| dc.identifier.issn | 20103778 | en_US |
| dc.identifier.issn | 2010376X | en_US |
| dc.identifier.other | 2-s2.0-79959613263 | en_US |
| dc.identifier.uri | https://repository.li.mahidol.ac.th/handle/123456789/11894 | |
| dc.rights | Mahidol University | en_US |
| dc.rights.holder | SCOPUS | en_US |
| dc.source.uri | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=79959613263&origin=inward | en_US |
| dc.subject | Engineering | en_US |
| dc.title | High-intensity nanosecond pulsed electric field effects on early physiological development in Arabidopsis thaliana | en_US |
| dc.type | Article | en_US |
| dspace.entity.type | Publication | |
| mu.datasource.scopus | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=79959613263&origin=inward | en_US |
