Publication:
K13-Mediated Reduced Susceptibility to Artemisinin in Plasmodium falciparum Is Overlaid on a Trait of Enhanced DNA Damage Repair

dc.contributor.authorAoli Xiongen_US
dc.contributor.authorPrem Prakashen_US
dc.contributor.authorXiaohong Gaoen_US
dc.contributor.authorMarvin Chewen_US
dc.contributor.authorIan Jun Jie Tayen_US
dc.contributor.authorCharles J. Woodrowen_US
dc.contributor.authorBevin P. Engelwarden_US
dc.contributor.authorJongyoon Hanen_US
dc.contributor.authorPeter R. Preiseren_US
dc.contributor.otherSingapore-MIT Alliance for Research and Technologyen_US
dc.contributor.otherSchool of Biological Sciencesen_US
dc.contributor.otherMassachusetts Institute of Technologyen_US
dc.contributor.otherMahidol Universityen_US
dc.date.accessioned2020-08-25T09:01:53Z
dc.date.available2020-08-25T09:01:53Z
dc.date.issued2020-08-04en_US
dc.description.abstract© 2020 The Author(s) Southeast Asia (SEA) has been the breeding ground for malaria drug resistance, including resistance to artemisinin, the first-line anti-malarial drug. In this study, Xiong et al. find a relationship between DNA damage repair and artemisinin resistance in SEA, leading to insights on the establishment and spread of current artemisinin resistance.en_US
dc.identifier.citationCell Reports. Vol.32, No.5 (2020)en_US
dc.identifier.doi10.1016/j.celrep.2020.107996en_US
dc.identifier.issn22111247en_US
dc.identifier.other2-s2.0-85088856605en_US
dc.identifier.urihttps://repository.li.mahidol.ac.th/handle/20.500.14594/57689
dc.rightsMahidol Universityen_US
dc.rights.holderSCOPUSen_US
dc.source.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85088856605&origin=inwarden_US
dc.subjectBiochemistry, Genetics and Molecular Biologyen_US
dc.titleK13-Mediated Reduced Susceptibility to Artemisinin in Plasmodium falciparum Is Overlaid on a Trait of Enhanced DNA Damage Repairen_US
dc.typeArticleen_US
dspace.entity.typePublication
mu.datasource.scopushttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85088856605&origin=inwarden_US

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